PlanarGROW range of thermal CVD Graphene Growth systems, are flexible instruments for the Growth and doping of Graphene.
Carbon Nanotubes (CNT) growth can also be achieved using the Planargrowth Systems with a small degree of adjustment.
Planartech, having over 50 systems worldwide, have installations with most of the key research institutions.
The thermal CVD system design is a horizontal reaction tube with gas inputs, temperature control, gas flow, vacuum and pressure, writable recipe and process storage, controlled with labview allowing remote access.
Flexibility of the system design to accommodate our customers is proving to be of great benefit, allowing researchers to request additional functionalities such as:
Single Reaction tube.
Dual Reaction tube.
Single Crystal Growth.
High Pressure facility.
Inductive Capacitance Plasma.
Square wave input into RF generator.
decreased gas cracking temp using RF Plasma.
There are three standard system configurations (planarGROW-2B, planarGROW-4S, and planarGROW-6E) providing a foundation for our customers to add their specific requirements.