RF Matching Network with Auto/manual tune

RF Matching Network with Auto/manual tune and control

Vac Techniche RF Matching Network with Auto/manual tune and control, t are designed and manufactured to be compatible with the RF generator with an output impedance of 50 ohms according to standards.

The plasma enclosure, plasma torch or other loads that require the application of RF power have and equivalent impedance other than 50 ohms and are usually accompanied by an inductor and capacitor segment. Therefore, a system is required to change the equivalent impedance to the generator impedance level in order to prevent the reflection of the power transmitted by the generator, protect the RF generator, maximize the power input to the load, make the processes repeatable, and provide the necessary field intensity in the enclosure before and after the formation of plasma.

This task is carried out by the impedance matching network, also called the match box
In normal situations, the matching network is built for an impedance range between 3 and 35 ohms. However, given the technical knowledge and practical experience of the Vac Techniche, providing matching networks for various load types such as sputter guns, RIEs, loads with capacitance-inductance coupling, and complicated loads such as helicon ion sources, atmospheric ICPs with E and H modes, atmospheric plasma torches, and loads with nonstandard or unconventional impedance ranges.

The impedance matching boxes are built with both manually and automatic ability.

Automatic Impedance Matching Network
Automatic impedance matching networks made by Vac Techniche, ATN-xx-BF, provide adaptability for the RF generator in applications such as PECVD, HDCVD, sputtering, and Ashing. These networks use DC drive motors to perform the matching. The vac Techniche automatic matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.

These networks use DC drive motors to perform the matching.

The Vac Techniche automatic matching networks perform their operation in three independent modes.

  • The automatic mode continuously compensates the impedance variation of the plasma enclosure.
  • The manual mode allows the operator to change the matching capacitance values during the process.
  • In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.

The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.
One of the most important features of the Vac Techniche ATN-xx-BF impedance matching networks is the short time (approximately 2 seconds) they take to form the plasma and perform complete matching for standard loads.

Matching network range 300w1000w, 2000w, 3000w, 5000w

Vac Techniche Manual Impedance Matching Network

Manual impedance matching networks made by Vac Techniche, MTC-xx-BF, provide matching for the radiofrequency generators in applications such as PECVD, HDCVD, sputtering, and Ashing. These networks perform matching by the graded volumes in the front panel of the system. The Vac Techniche manual matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure.

Some of the benefits of the MTC-xx-BF model are moderately prices and a wide range of impedance and even custom impedance ranges. Also, the gearbox in its structure has increased the adjustment accuracy.

 

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