Thermal CVD MoS2 and TMD Growth Systems

Thermal CVD MoS2/TMD Growth Systems

Planartech 2D growth systems

PlanarGROW range of thermal CVD MoS2 / TMD growth systems have a flexible approach to the growth of MoS2 and other metal dichalcogenides.
Planartech, now over 50 systems worldwide, have installations with the key research institutions.
The planargrowth-2S-MoS2 thermal CVD system design is a horizontal reaction tube with gas inputs, temperature control, gas flow, vacuum and pressure, writable recipe and process storage, controlled with labview allowing remote access.

The standard MoS2 system, planarGROW-2S-MoS2, which acts as our base design providing a foundation for our customers to add their specific requirements.

The standard system can be customized to the user’s specific application requirements. MoS2 can be grown from solid sources or gas precursors. In addition, the system supports dual process use for both MoS2 and graphene.
Flexibility of the system design to accommodate our customers is proving to be of great benefit, allowing researchers to request additional functionalities such as:
  • MoS2 from solid source, (Sulphur powder and MoO3)
  • Precursors gas lines
  • Single reaction tube.
  • Dual reaction tube.
  • Supports Graphene and TMD growth.